Dong-Min Han

Title: The Innovative Contributions of Dong-Min Han

Introduction

Dong-Min Han is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of semiconductor technology. His work is particularly recognized for its impact on the efficiency and functionality of semiconductor devices.

Latest Patents

Dong-Min Han holds a patent for a semiconductor device that includes a bit line. This innovative device features a substrate with a cell array region that contains a cell active region. An insulating pattern is placed on the substrate, which includes a direct contact hole that exposes the cell active region. A direct contact conductive pattern is situated within this hole, connecting to the cell active region. The bit line is positioned on the insulating pattern and is connected to the direct contact conductive pattern, extending orthogonally to the upper surface of the insulating pattern. The insulating pattern consists of a first insulating layer made from a non-metal-based dielectric material and a second insulating layer made from a metal-based dielectric material, which has a higher dielectric constant than the first.

Career Highlights

Dong-Min Han is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics industry. His work at Samsung has allowed him to be at the forefront of semiconductor innovation. His contributions have been instrumental in advancing the technology used in various electronic devices.

Collaborations

Throughout his career, Dong-Min Han has collaborated with talented individuals such as Yoo-Sang Hwang and Bong-Soo Kim. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Dong-Min Han's innovative work in semiconductor technology exemplifies the importance of research and development in the electronics industry. His contributions continue to influence the field and pave the way for future advancements.