Disan, South Korea

Dong Hyun Kim

This inventor holds 1 USPTO granted patent. Top assignee: Ulsan Chemical Co., Ltd.. Active years: 2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dong Hyun Kim. Retrieved from https://idiyas.com/inventor/dong-hyun-kim-erwtkl7d

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: Innovations of Dong Hyun Kim in Semiconductor Processes.

Introduction

Dong Hyun Kim is a notable inventor based in Disan, South Korea. He has made significant contributions to the field of semiconductor processes, particularly through his innovative patent.

Latest Patents

Dong Hyun Kim holds a patent for a method titled "Dry-etching gas for semiconductor process and preparation method thereof." This invention focuses on the continuous preparation of highly pure octafluorocyclopentene, which is essential for dry-etching processes. The method involves reacting octachlorocyclopentene with KF in a continuous manner and purifying the resulting crude octafluorocyclopentene. The process ensures that the gaseous octafluorocyclopentene composition achieves a purity level of 99.995 vol % or higher, with minimal impurities.

Career Highlights

Dong Hyun Kim is currently employed at Ulsan Chemical Co., Ltd., where he continues to develop innovative solutions in the semiconductor industry. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

He collaborates with talented coworkers, including Hae Seok Ji and Ook Jae Cho, who contribute to the innovative environment at Ulsan Chemical Co., Ltd.

Conclusion

Dong Hyun Kim's contributions to semiconductor processes through his patent demonstrate his commitment to innovation and excellence in the field. His work continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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