Ichon, South Korea

Dong Hyong Lee

This inventor holds 1 USPTO granted patent. Top assignee: Stats Chippac Pte. Ltd.. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dong Hyong Lee. Retrieved from https://idiyas.com/inventor/dong-hyong-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Innovations of Dong Hyong Lee

Introduction

Dong Hyong Lee is a notable inventor based in Ichon-si, South Korea. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique system that enhances the efficiency of semiconductor chip production.

Latest Patents

One of Dong Hyong Lee's key patents is titled "System for peeling semiconductor chips from tape." This invention involves a semiconductor system designed to peel semiconductor chips from tape effectively. The system comprises an outer housing with an aperture on the top, a magnet with a needle base extension, and needles that are magnetically held to the magnet. Additionally, it applies a vacuum through the aperture to hold an adhesive material to the outer housing while extending the needles through the aperture.

Career Highlights

Dong Hyong Lee is currently employed at Stats Chippac Pte. Ltd., a company known for its expertise in semiconductor packaging and testing. His work at this organization has allowed him to collaborate with other talented professionals in the field.

Collaborations

Some of his coworkers include Gab Yong Min and Jung Ho Kim, who contribute to the innovative environment at Stats Chippac Pte. Ltd. Their collective efforts enhance the company's capabilities in semiconductor technology.

Conclusion

Dong Hyong Lee's contributions to semiconductor technology through his innovative patent demonstrate his expertise and commitment to advancing the industry. His work continues to influence the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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