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Years Active: 2023
Title: The Innovative Contributions of Dong Hak Jang
Introduction
Dong Hak Jang is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of thin film technology, particularly through his innovative patent. His work has implications for various industries, showcasing the importance of advancements in material science.
Latest Patents
Dong Hak Jang holds a patent for a method of forming a thin film using a surface protection material. This method involves several steps, including supplying the surface protection material to a substrate within a chamber, purging unadsorbed materials, and introducing a metal precursor that reacts with the surface protection material to form a thin film. This innovative approach enhances the efficiency and effectiveness of thin film production.
Career Highlights
Throughout his career, Dong Hak Jang has worked with prominent companies such as Egtm Co., Ltd. and SK Hynix Inc. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technologies in the semiconductor and materials sectors.
Collaborations
Dong Hak Jang has collaborated with talented individuals in his field, including Geun Su Lee and Jae Min Kim. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Dong Hak Jang's contributions to thin film technology and his innovative patent demonstrate his commitment to advancing material science. His work continues to influence the industry and inspire future innovations.