Donald Schlosser

Title: The Innovations of Donald Schlosser

Introduction

Donald Schlosser is a notable inventor based in San Jose, California. He has made significant contributions to the field of extreme ultraviolet lithography. His work focuses on enhancing the precision and efficiency of lithographic processes, which are crucial in semiconductor manufacturing.

Latest Patents

Donald Schlosser holds a patent for PECVD films for EUV lithography. This patent provides multi-layer stacks designed to achieve optimum etch contrast, allowing for the shrinking of features and smoothing of edges. The technology enables the use of an optical leveling sensor with minimal error. The multi-layer stacks include an atomically smooth layer with an average local roughness of less than a monolayer, along with one or more underlayers positioned between the target layer to be patterned and a photoresist. Additionally, the patent outlines methods for depositing these multi-layer stacks.

Career Highlights

Schlosser is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has positioned him as a key player in advancing lithography technologies. His innovative approaches have contributed to the development of more efficient manufacturing processes in the semiconductor sector.

Collaborations

Throughout his career, Donald Schlosser has collaborated with esteemed colleagues, including Nader Shamma and Thomas W Mountsier. These collaborations have fostered an environment of innovation and have led to significant advancements in their respective fields.

Conclusion

Donald Schlosser's contributions to extreme ultraviolet lithography exemplify the impact of innovation in the semiconductor industry. His patent and work at Lam Research Corporation highlight the importance of precision in manufacturing processes.