This inventor holds 2 USPTO granted patents. Top assignee: Gte Laboratories Incorporated. Active years: 1976-1986.
Company Filing History:
Years Active: 1976-1986
Title: The Innovations of Donald M. Koffman
Introduction
Donald M. Koffman is a notable inventor based in Winchester, MA (US). He has made significant contributions to the field of electromagnetic radiation and plating technologies. With a total of 2 patents, Koffman has demonstrated his expertise and innovative spirit in his work.
Latest Patents
Koffman's latest patents include the "Flat Profile Grating Coupler" and the "Coating Thickness Monitor for Multiple Layers." The Flat Profile Grating Coupler is designed to efficiently couple electromagnetic radiation in the far-infrared and submillimeter microwave regions to surface electromagnetic waves. This device utilizes a base metal substrate with periodic alternating areas of differing dielectric constants to enhance coupling between surface plasmons and free photons. The invention also explores various methods for creating these dielectric constant areas, including selective overplating and annealing of amorphous materials.
The Coating Thickness Monitor for Multiple Layers is an innovative apparatus that measures the plating thickness of a thin gold coating on substrates such as sheets or thin wires. This technology employs an X-ray analysis technique to provide real-time measurements of gold plating thickness, which can range from one to about one hundred and fifty microinches. By analyzing the X-ray emissions from both the gold plating and the substrate, the device enables accurate and rapid monitoring of gold plating thickness, allowing for precise feedback control during the plating process.
Career Highlights
Koffman has worked at GTE Laboratories Incorporated, where he has been able to apply his inventive skills and knowledge. His work has contributed to advancements in both electromagnetic technologies and plating processes.
Collaborations
Throughout his career, Koffman has collaborated with notable colleagues such as Paul Lublin and Robert J. Seymour. These collaborations have likely enriched his work and led to further innovations in his field.
Conclusion
Donald M. Koffman is a distinguished inventor whose contributions to technology have made a significant impact. His patents reflect his innovative approach to solving complex problems in electromagnetic radiation and plating technologies.