Morris Plains, NJ, United States of America

Donald L White


Average Co-Inventor Count = 1.7

ph-index = 13

Forward Citations = 607(Granted Patents)


Location History:

  • Bernardsville, NJ (US) (1976 - 1986)
  • Springfield, NJ (US) (1990)
  • Lake Parsippany, NJ (US) (1992 - 1993)
  • Morris Plains, NJ (US) (1994 - 2005)

Company Filing History:


Years Active: 1976-2005

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21 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Donald L. White

Introduction: Donald L. White is a distinguished inventor based in Morris Plains, NJ, known for his significant contributions to the field of lithography and imaging technologies. With a remarkable portfolio of 21 patents, he has made pivotal advancements that enhance the precision and efficiency of device fabrication in various industries.

Latest Patents: Among his latest patents, one notable invention is a holder, system, and process for improving overlay in lithography. This innovative mechanism addresses long-range errors between the image of a mask and existing patterns on a wafer. By employing either a through-the-lens alignment metrology system or an around-the-lens metrology system, long-range errors are effectively corrected. Deformation values are computed to counteract these errors, and the system utilizes actuators, such as piezoelectric ceramics, to realign the mask’s projected image with the existing pattern.

Another significant patent by White focuses on a lithographic process for device fabrication using dark-field illumination. This inventive process utilizes dark-field imaging to project mask features into an energy-sensitive resist material. By implementing off-axis illumination and strategically designing masks, the system enhances the resolution of lithographic features that would otherwise be too small to resolve with traditional imaging optics, thereby streamlining the fabrication process.

Career Highlights: Donald L. White has had a distinguished career, including notable positions at prestigious organizations like AT&T Bell Laboratories and Bell Telephone Laboratories. His work at these institutions has been essential in developing cutting-edge technologies that are widely used in modern electronics.

Collaborations: Throughout his career, White has collaborated with esteemed professionals, including Martin Barry Feldman and Obert R. Wood, II. These partnerships have facilitated research and innovation, further enriching the landscape of lithography and imaging technologies.

Conclusion: Donald L. White's contributions to the field of lithography through his innovative patents have had a profound impact on device fabrication techniques. His commitment to advancing technology continues to inspire future inventors and researchers in the industry. With a legacy of innovation and collaboration, White remains a significant figure in the evolution of imaging technologies.

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