Donald J Riley

Donald J. Riley is a notable inventor based in Tenafly, NJ (US). He has made significant contributions to the field of aluminum processing, particularly in the production of lithographic plates. With a total of 3 patents to his name, Riley's work has had a lasting impact on the industry.

Latest Patents

Riley's latest patents include innovative methods for electrolytically graining aluminum metal sheets. One of his patents describes a method for producing aluminum sheets for lithographic plates by electrolytically etching the surface in an aqueous mineral acid electrolyte solution. This process utilizes direct current with superimposed alternating current. Additionally, he has developed a method for electrolytically graining a lithographic plate, which produces a grained surface with a honeycomb topography and a non-directional grain structure. This method significantly reduces the production of smut by employing alternating current of higher frequencies, generally in the range of approximately 140 to 400 Hz.

Career Highlights

Riley has spent a considerable part of his career at Polychrome Corporation, where he has been able to apply his innovative ideas and techniques. His work has not only advanced the technology in aluminum processing but has also contributed to the efficiency and quality of lithographic plates.

Collaborations

Throughout his career, Riley has collaborated with talented individuals such as Jen-Chi Huang and Gregory Von Gruenberg. These collaborations have fostered an environment of innovation and creativity, leading to the development of groundbreaking technologies in the field.

Conclusion

Donald J. Riley's contributions to the field of aluminum processing through his patents and career at Polychrome Corporation highlight his role as a significant inventor. His innovative methods continue to influence the industry and pave the way for future advancements.