The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 1985
Filed:
Sep. 28, 1984
Applicant:
Inventors:
Jen-chi Huang, Ossining, NY (US);
Gregory Von Gruenberg, Mohegan Lake, NY (US);
Donald J Riley, Tenafly, NJ (US);
Assignee:
Polychrome Corp., Yonkers, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25F / ;
U.S. Cl.
CPC ...
2041294 ; 20412975 ; 204D / ;
Abstract
A method is provided for electrolytically graining an aluminum lithographic plate to produce a grained surface with a honeycomb topography, non-directional grain structure, and a substantially reduced production of smut. The reduction of smut is achieved by utilizing an alternating current of higher frequencies, generally in the range of approximately 140 to 400 Hz.