Donald A Tiffin

Title: Donald A. Tiffin and His Patent Work in X-Ray Measurement

Introduction

Donald A. Tiffin is an inventor associated with Austin, Texas, and Advanced Micro Devices Corporation. His patent work includes methods for using X-ray techniques to analyze surface roughness and identify elements in thin films. He is credited with 4 patents.

Latest Patents

One of Tiffin’s latest patents, “Apparatus and Method for Measuring the Roughness of a Target Material,” describes an X-ray fluorescence system for measuring a target surface’s roughness. An X-ray source directs a beam at the surface, and a detector measures scattered photons. A computer analyzes the detected photon counts and uses calibration data to calculate a roughness value.

Another patent, “Apparatus and Method for Characterizing Particles Embedded Within a Thin Film,” presents a technique for determining the identity and quantity of elements in a thin film. A radioisotopic source directs primary X-rays at a sample at near-grazing angles, causing the film to emit characteristic secondary X-rays. A detector measures the photons’ energies, enabling analysis of the elements present.

Career Highlights

Tiffin’s described inventions apply X-ray measurement to materials analysis. Together, they address two distinct challenges: assessing the texture of a surface and characterizing elements embedded in a thin film over a semiconductor substrate. His work is associated with Advanced Micro Devices Corporation.

Collaborations

Tiffin’s listed coworkers include Tim Z. Hossain and Joel R. Stanford. Their shared association with Advanced Micro Devices Corporation provides context for his professional collaborations.

Conclusion

Donald A. Tiffin’s patent work demonstrates how X-ray techniques can support precise analysis of surfaces and thin-film materials, contributing tools relevant to semiconductor research and manufacturing.