Cape Coral, FL, United States of America

Don Syversrud

This inventor holds 1 USPTO granted patent. Top assignee: University of California. Active years: 2022.


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2022

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Don Syversrud: Innovator in Plasma Channel Technology

Introduction

Don Syversrud is a notable inventor based in Cape Coral, Florida. He has made significant contributions to the field of plasma technology, particularly in the development of devices and methods for creating plasma channels. His innovative work has the potential to advance laser plasma acceleration techniques.

Latest Patents

Don Syversrud holds a patent for "Devices and methods for creating plasma channels for laser plasma acceleration." This patent describes systems, methods, and apparatus related to creating hollow, near-hollow, and parabolic plasma channels. The device includes a block of material that defines a cylindrical channel with a first open end and a second open end. The block also features gas ports that are in fluid communication with the channel, and a cooling system that operates to cool the channel below the freezing point of a gas. This invention represents a significant advancement in the field of plasma technology.

Career Highlights

Throughout his career, Don Syversrud has been associated with the University of California, where he has contributed to various research initiatives. His work has focused on enhancing the understanding and application of plasma channels in laser technology.

Collaborations

Don has collaborated with talented individuals such as Tyler Sipla and Hann-Shin Mao, who have contributed to his research endeavors.

Conclusion

Don Syversrud's innovative work in plasma channel technology exemplifies the impact of dedicated research and development in advancing scientific knowledge. His contributions continue to influence the field and inspire future innovations.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…