The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2022
Filed:
Nov. 09, 2020
Wim Leemans, Hamburg, DE;
Kelly Swanson, San Francisco, CA (US);
Hann-shin Mao, Richmond, CA (US);
Don Syversrud, Cape Coral, FL (US);
Anthony Gonsalves, Berkeley, CA (US);
Tyler Sipla, Oakland, CA (US);
Wim Leemans, Hamburg, DE;
Kelly Swanson, San Francisco, CA (US);
Hann-Shin Mao, Richmond, CA (US);
Don Syversrud, Cape Coral, FL (US);
Anthony Gonsalves, Berkeley, CA (US);
Tyler Sipla, Oakland, CA (US);
The Regents of the University of California, Oakland, CA (US);
Abstract
This disclosure provides systems, methods, and apparatus related to devices and methods for creating hollow, near-hollow, and parabolic plasma channels. In one aspect, a device includes a block of material and a cooling system. The block of material defines a channel having a cylindrical shape and having a first open end and a second open end. An axis of the channel lies along a straight line. The block of material further defines a first gas port and a second gas port. The first gas port and the second gas port are in fluid communication with channel. The cooling system is operable to cool the channel to below the freezing point of a gas.