Don L Yates

Title: Don L Yates: Innovator in Semiconductor Technology

Introduction

Don L Yates is a prominent inventor based in Boise, ID (US), known for his significant contributions to semiconductor technology. With a total of 10 patents to his name, Yates has made remarkable advancements in the field, particularly in the development of dielectric materials and their applications in semiconductor structures.

Latest Patents

Yates' latest patents include innovative methods for forming semiconductor structures that utilize dielectric materials with curvilinear profiles. One of his notable inventions involves methods for forming nickel material on bond pads, which includes curing dielectric material to create a steep curvilinear profile. This technology allows for the formation of relatively thick nickel materials on bond pads smaller than approximately 50 micrometers. Additionally, he has developed methods for removing dielectric materials from substrates, which involve varying temperatures to achieve different etch rates for silicon nitride and silicon oxide.

Career Highlights

Don L Yates is currently employed at Micron Technology Incorporated, where he continues to push the boundaries of semiconductor innovation. His work has not only contributed to the advancement of technology but has also positioned him as a key figure in the industry.

Collaborations

Yates collaborates with talented coworkers, including Li Li and Yangyang Sun, to further enhance the research and development efforts at Micron Technology. Their combined expertise fosters a creative environment that drives innovation in semiconductor technology.

Conclusion

In summary, Don L Yates is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the field. His innovative patents and collaborative efforts at Micron Technology continue to shape the future of semiconductor applications.