Topsfield, MA, United States of America

Don Berrian

USPTO Granted Patents = 5 

Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2011-2015

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5 patents (USPTO):Explore Patents

Title: **Don Berrian: Innovator in Ion Implantation Technology**

Introduction

Don Berrian is a prominent inventor based in Topsfield, MA, with a focus on advanced ion implantation technologies. With a total of five patents to his name, he has made significant contributions to the field of semiconductor manufacturing. His innovations in ion implantation have the potential to streamline processes and enhance the precision of device fabrication.

Latest Patents

Among his latest inventions is the "Ion Implanter and Ion Implant Method Thereof." This patent introduces an innovative ion implanter that simplifies the way wafers are processed. The design allows for the wafer to move in one direction while an aperture mechanism moves in another, creating a two-dimensional scan of the ion beam across the wafer. This approach reduces both the hardware complexity and operational demands, especially when utilizing a ribbon ion beam that mimics traditional spot beams.

Additionally, Berrian has developed a method that utilizes a variable aperture within an aperture device. This invention enables the shaping of the ion beam before implantation, allowing various substrates to receive customized treatments without the need for multiple fixed apertures. As a result, costs and operational complexity are significantly reduced, while the speed of obtaining a specific ion beam is enhanced.

Career Highlights

Don Berrian's work at Advanced Ion Beam Technology, Inc. has positioned him as a leader in the semiconductor industry. His expertise in ion implantation technology has directly influenced advancements in how devices are produced, ultimately improving manufacturing efficiency and product quality.

Collaborations

Throughout his career, Berrian has collaborated with skilled engineers and scientists, including Zhimin Wan and John D Pollock. These partnerships have fostered an environment of innovation and knowledge sharing, leading to breakthroughs in ion implantation techniques.

Conclusion

Don Berrian's contributions to ion implantation technology highlight his role as a key inventor in the semiconductor sector. His patents not only reflect his innovative spirit but also pave the way for future advancements in semiconductor processing, making him a significant figure in the realm of modern inventions.

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