Dominique Jourde

Title: The Innovations of Dominique Jourde

Introduction

Dominique Jourde is a notable inventor based in Seyssins, France. He has made significant contributions to the field of substrate technology, holding two patents that showcase his innovative approach to engineering.

Latest Patents

One of his latest patents is a method for building a substrate holder. This method involves creating a stack of at least two substrates, each with two opposite main faces. The substrates are secured together so that one main face of the first substrate faces one main face of the second substrate, positioned against an etch-stop material. The process includes etching through the first substrate, stopping at the etch-stop material, to create a location that can receive a substrate supported by the holder. Another patent involves a device that allows the treatment of a substrate in a machine designed for larger substrates, along with a system for mounting a substrate in this device.

Career Highlights

Throughout his career, Dominique Jourde has worked with prominent organizations, including the Commissariat à l'Énergie Atomique and the Commissariat à l'Énergie Atomique et aux Énergies Alternatives. His work in these institutions has contributed to advancements in energy and materials science.

Collaborations

Dominique has collaborated with notable colleagues such as Gérard Turc and Frank Fournel, further enhancing his contributions to the field.

Conclusion

Dominique Jourde's innovative patents and career achievements reflect his dedication to advancing substrate technology. His work continues to influence the industry and inspire future innovations.