The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 09, 2014

Filed:

May. 19, 2011
Applicants:

Frank Fournel, Villard-Bonnot, FR;

Laurent Bally, Saint-Georges-de-Commiers, FR;

Marc Zussy, Saint Egreve, FR;

Dominique Jourde, Seyssins, FR;

Inventors:

Frank Fournel, Villard-Bonnot, FR;

Laurent Bally, Saint-Georges-de-Commiers, FR;

Marc Zussy, Saint Egreve, FR;

Dominique Jourde, Seyssins, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); C23F 1/02 (2006.01); H01L 21/687 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
C23F 1/02 (2013.01); H01L 21/68714 (2013.01); H01L 21/67 (2013.01);
Abstract

A method for making a support of at least one substrate, including: making a stack including at least two substrates, each of the two substrates including two opposite main faces, both substrates being secured to each other such that one of the main faces of a first of the two substrates is positioned facing one of the main faces of the second of the two substrates and against an etch-stop material; etching, through the first of the two substrates and with stop on the etch-stop material, at least one location that can receive a substrate that can be supported by the support.


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