This inventor holds 5 USPTO granted patents. Top assignees: Quantiscript, Inc., Université De Sherbrooke. Active years: 1999-2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1999-2005
Title: The Innovative Contributions of Dominique Drouin
Introduction
Dominique Drouin is a prominent inventor based in Deauville, CA. She has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. Her work focuses on advanced lithography methods and materials that enhance the fabrication of semiconductor structures.
Latest Patents
One of her latest patents is titled "Fabrication of structures of metal/semiconductor compound by X-ray/EUV projection lithography." This innovative lithography method allows for the creation of etch-resistant metal-semiconductor compounds on substrates with sub-micrometer scale resolutions. The process involves depositing superposed layers of metal and semiconductor that react to form the desired compound. The use of X-ray and EUV radiation through patterned masks enables precise control over the structures formed.
Another notable patent is for a "Plasma polymerized electron beam resist." This process involves depositing a layer of plasma polymerized fluoropolymer on a substrate to create a negative electron beam resist. The method allows for the definition of patterns using an electron beam, followed by the removal of unexposed areas to leave the desired pattern intact on the substrate.
Career Highlights
Throughout her career, Dominique has worked with various organizations, including Quantiscript, Inc. and Université de Sherbrooke. Her experience in these institutions has contributed to her expertise in semiconductor fabrication and materials science.
Collaborations
Dominique has collaborated with notable colleagues such as Jacques Beauvais and Eric Lavallee. These partnerships have further enriched her research and development efforts in the field.
Conclusion
Dominique Drouin's innovative work in semiconductor technology and her numerous patents highlight her significant contributions to the industry. Her advancements in lithography methods and materials continue to influence the field and pave the way for future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
