Location History:
- Mesa, AZ (US) (1997 - 1998)
- Woodbury, CT (US) (1995 - 1999)
Company Filing History:
Years Active: 1995-1999
Title: The Innovative Contributions of Dominic Changwon Yang
Introduction
Dominic Changwon Yang is a notable inventor based in Mesa, AZ (US). He has made significant contributions to the field of materials science, particularly in the development of advanced photoresist technologies. With a total of 5 patents to his name, Yang's work has had a profound impact on the industry.
Latest Patents
Yang's latest patents include innovative formulations for photosensitive polyimide precursors. These new photosensitive polyamic acid precursors are characterized by a specific formula where Z is a tetravalent organic radical containing at least one aromatic ring, Z' is a divalent organic radical with at least one aromatic ring, and R* is a photo polymerizable group. Notably, compounds such as BPDA-PDA and BPDA-ODA polyamic acid precursors are highlighted. The precursor compositions demonstrate excellent photoresolution and are suitable for i-line, g-line, and i-/g-line applications. The films produced exhibit remarkable self-adhesion, low internal stress, and high thermal stability, making them ideal for various substrates.
Another significant patent involves the use of acid scavengers in chemically amplified photoresists. Yang's work with proton sponge, berberine, and cetyltrimethyl ammonium hydroxide base compounds enhances the performance of photoresists based on modified polyhydroxystyrene (PHS). These additives effectively scavenge free acids, preserving the acid-labile moieties on the modified PHS polymer. This innovation not only improves the shelf-life of the photoresist composition but also ensures compatibility with industrial processing conditions.
Career Highlights
Dominic Changwon Yang is currently employed at International Business Machines Corporation (IBM), where he continues to push the boundaries of innovation in his field. His expertise in materials science and photoresist technology has positioned him as a key player in the industry.
Collaborations
Yang has collaborated with esteemed colleagues such as Nageshwer Rao Bantu and William R Brunsvold, contributing to the advancement of their shared research goals.
Conclusion
Dominic Changwon Yang's contributions to the field of materials science and photoresist technology are noteworthy. His innovative patents and ongoing work at IBM highlight his commitment to advancing technology and improving industrial processes.
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