The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 1997
Filed:
Oct. 11, 1996
Nageshwer Rao Bantu, Hopewell Junction, NY (US);
William Ross Brunsvold, Poughkeepsie, NY (US);
George Joseph Hefferon, Fishkill, NY (US);
Wu-Song Huang, Poughkeepsie, NY (US);
Ahmad D Katnani, Poughkeepsie, NY (US);
Mahmoud M Khojasteh, Poughkeepsie, NY (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
Dominic Changwon Yang, Mesa, AZ (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Proton sponge, berberine, and cetyltrimethyl ammonium hydroxide base compounds are used as additives to chemically amplified photoresists based on modified polyhydroxystyrene (PHS). The base additives scavenge free acids from the photoresist in order to preserve the acid labile moieties on the modified PHS polymer. The base additives are well suited to industrial processing conditions, do not react with the photoacid compounds in the photoresist composition to form byproducts which would hinder photoresist performance, and extend the shelf-life of the photoresist composition. In addition, the proton sponge and berberine base additives have a different absorption spectra than the modified PHS polymer, therefore, the quantity of base additive within the photoresist can be easily assayed and controlled.