Do Han Kim

Title: The Innovative Contributions of Do Han Kim

Introduction

Do Han Kim is a notable inventor based in Melrose, MA (US). He has made significant contributions to the field of polymeric coatings through his innovative patent. His work focuses on enhancing the fabrication processes of topcoats, which are essential in various applications.

Latest Patents

Do Han Kim holds a patent titled "Method of forming topcoat for patterning." This patent discloses a method for the fabrication of polymeric topcoats via initiated chemical vapor deposition (iCVD) or photoinitiated chemical vapor deposition (piCVD). These methods, in conjunction with directed self-assembly (DSA) of block copolymers, enable the generation of high-resolution patterns. The topcoat deposited by iCVD or piCVD allows for conformal, ultra-thin, uniform, pinhole-free coatings. This innovation facilitates the use of a diverse range of block copolymer materials for DSA and supports the seamless integration of topcoats for pattern transfer processes. Do Han Kim has 1 patent to his name.

Career Highlights

Throughout his career, Do Han Kim has worked with prestigious institutions such as the Massachusetts Institute of Technology and the University of Chicago. His experience in these renowned organizations has contributed to his expertise in the field of polymer science and engineering.

Collaborations

Do Han Kim has collaborated with notable individuals in his field, including Hyo Seon Suh and Priya Moni. These collaborations have likely enriched his research and development efforts, leading to innovative solutions in polymeric coatings.

Conclusion

Do Han Kim's contributions to the field of polymeric topcoats demonstrate his innovative spirit and commitment to advancing technology. His patent reflects a significant step forward in the fabrication of high-resolution patterns, showcasing the potential for future applications in various industries.