Do-haing Lee

Title: Do-haing Lee: Innovator in Layer-by-Layer Etching Technology

Introduction

Do-haing Lee is a prominent inventor based in Suwon, South Korea. He has made significant contributions to the field of etching technology, particularly through his innovative approaches that enhance precision and minimize damage during the etching process. With a total of 3 patents to his name, Lee's work is recognized for its impact on various applications in material science and engineering.

Latest Patents

One of Lee's latest patents is the "Layer-by-layer etching apparatus using neutral beam and method of etching using the same." This invention allows for the control of etching depth at an atomic level by precisely managing the etching of each atom in a material layer. The method involves loading a substrate onto a stage in a reaction chamber, supplying an etching gas, and using a neutral beam to achieve damage-free etching. Another notable patent is the "Etching apparatus using neutral beam," which provides a damage-free solution for large-area etching. This apparatus utilizes a neutral beam to perform etching without causing electrical or physical damage, showcasing Lee's commitment to advancing etching technology.

Career Highlights

Do-haing Lee is affiliated with Sungkyunkwan University, where he continues to engage in research and development in the field of etching technology. His work has garnered attention for its innovative approaches and practical applications in various industries.

Collaborations

Lee has collaborated with notable colleagues, including Geun-Young Yeom and Min-jae Chung, contributing to the advancement of etching technologies through teamwork and shared expertise.

Conclusion

Do-haing Lee's contributions to layer-by-layer etching technology exemplify his innovative spirit and dedication to precision in material processing. His patents reflect a commitment to enhancing the capabilities of etching methods, making a significant impact in the field.