Dmitry Simakov

Title: Dmitry Simakov: Innovator in Optical Systems

Introduction

Dmitry Simakov is a notable inventor based in Jena, Germany. He has made significant contributions to the field of optical systems, particularly in the area of imaging quality determination and photomask measurement.

Latest Patents

Dmitry holds two patents that showcase his innovative approach. The first patent is a method for determining the imaging quality of an optical system when illuminated by illumination light within a pupil to be measured. This method involves arranging a periodic test structure in the object plane of the optical system and specifying an initial illumination angle distribution. By illuminating the test structure in various distance positions, an initial measured aerial image is determined. The process is repeated for different illumination angle distributions, allowing for a comprehensive analysis of the optical system's imaging quality.

The second patent pertains to a method for measuring photomasks used in semiconductor lithography. This invention outlines a systematic approach to accurately measure photomasks, which are critical in the manufacturing of semiconductor devices.

Career Highlights

Dmitry is currently associated with Carl Zeiss SMT GmbH, a leading company in the field of optical systems and lithography. His work at this esteemed organization has allowed him to further develop his expertise and contribute to groundbreaking advancements in optical technology.

Collaborations

Throughout his career, Dmitry has collaborated with notable colleagues, including Thomas Thaler and Steffen Steinert. These collaborations have enriched his research and innovation efforts, leading to significant advancements in their respective fields.

Conclusion

Dmitry Simakov is a distinguished inventor whose work in optical systems has led to valuable patents and advancements in technology. His contributions continue to influence the field and inspire future innovations.