This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Dmitry Igorevich Astakhov: Inventor in Patterning-System Contamination Reduction.
Introduction
Dmitry Igorevich Astakhov is an inventor associated with Eindhoven, the Netherlands, and ASML Netherlands B.V. His patent work addresses contamination reduction in plasma environments used with patterning systems.
Latest Patents
Astakhov is credited with 1 patent: “Contamination reduction system.” The invention describes a support for holding a patterning system in a radiation beam, a shutter that shields part of the beam, and an electrode positioned between the shutter and the support. Connected to a voltage source, the electrode generates an electric field between itself and the patterning system, helping reduce contamination.
Career Highlights
Astakhov’s listed patent reflects work on contamination-control technology for patterning systems. His professional affiliation is ASML Netherlands B.V., a company associated with semiconductor lithography and related technologies.
Collaborations
Astakhov’s listed coworkers include Vladimir Kvon and Marcus Adrianus Van De Kerkhof.
Conclusion
Dmitry Igorevich Astakhov’s patent focuses on using an electrically generated field to reduce contamination around a patterning system, highlighting his contribution to this area of technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile