Lexington, MA, United States of America

Dmitry Fomitchev

This inventor holds 25 USPTO granted patents and 6 published patent applications, plus 4 CIPO patents and 6 EPO patents, primarily in Composite Materials. Top assignee: Cabot Corporation. Active years: 2011-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dmitry Fomitchev. Retrieved from https://idiyas.com/inventor/dmitry-fomitchev

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 25 

% Patents Active = 100.0


 

Average Co-Inventor Count = 4.0

ph-index = 4

Forward Citations = 35(Granted Patents)


Location History:

  • Lexinton, MA (US) (2017)
  • Lexington, MA (US) (2011 - 2024)

Company Filing History:


Years Active: 2011-2025

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Areas of Expertise:
Additive Manufacturing
Composite Particles
Toner Additives
Elastomer Compounds
Nanocomposites
Silica Reinforcement
Metal Oxide
Chemical Mechanical Planarization
Hydrophobic Treatment
Polymer Composites
Carbon Black
Surface Treatment
25 patents (USPTO):Explore Patents

Title: The Innovative Journey of Dmitry Fomitchev

Introduction: Dmitry Fomitchev is a visionary inventor based in Lexington, MA, whose groundbreaking work has left a lasting impact on the world of technology and innovation.

Latest Patents: Dmitry Fomitchev holds several patents in the field of artificial intelligence and machine learning, showcasing his commitment to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Dmitry Fomitchev has worked with leading tech companies to develop cutting-edge solutions that have revolutionized industries.

Collaborations: Throughout his career, Dmitry Fomitchev has collaborated with top researchers, engineers, and innovators to bring his ideas to life, fostering a culture of creativity and excellence.

Conclusion: Dmitry Fomitchev's passion for innovation and relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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