Company Filing History:
Years Active: 2017
Title: Dmitry Dinega: Innovator in Chemical Mechanical Polishing
Introduction
Dmitry Dinega is a notable inventor based in Aurora, IL (US). He has made significant contributions to the field of chemical mechanical polishing, particularly in the development of compositions and methods for selective removal of silicon nitride. His work is essential for advancements in semiconductor manufacturing.
Latest Patents
Dinega holds a patent for "CMP compositions and methods for selective removal of silicon nitride." This invention provides chemical mechanical polishing compositions and methods for polishing a substrate that includes silicon dioxide and silicon nitride. The method allows for the selective removal of silicon nitride relative to silicon oxide on patterned wafers. The CMP composition consists of a particulate abrasive, such as ceria, suspended in an aqueous carrier, and includes a cationic polymer with pendant quaternized nitrogen-heteroaromatic moieties. The composition is designed to have a pH greater than about 3.
Career Highlights
Dmitry Dinega is associated with Cabot Microelectronics Corporation, where he applies his expertise in chemical mechanical polishing. His innovative work has contributed to the efficiency and effectiveness of semiconductor processing techniques.
Collaborations
Dinega has collaborated with notable colleagues, including Sairam Shekhar and Renhe Jia. These collaborations have further enhanced the research and development efforts in the field of chemical mechanical polishing.
Conclusion
Dmitry Dinega's contributions to the field of chemical mechanical polishing demonstrate his innovative spirit and commitment to advancing semiconductor technology. His patent and work at Cabot Microelectronics Corporation highlight his role as a key inventor in this critical area of research.