Santa Clara, CA, United States of America

Dmitriy Panasyuk


Average Co-Inventor Count = 23.0

ph-index = 3

Forward Citations = 68(Granted Patents)


Company Filing History:


Years Active: 2015-2024

Loading Chart...
8 patents (USPTO):

Title: Innovations of Dmitriy Panasyuk

Introduction

Dmitriy Panasyuk is a notable inventor based in Santa Clara, CA, with a remarkable portfolio of eight patents. His work primarily focuses on advancements in processing substrates through innovative methods.

Latest Patents

One of his latest patents involves a PECVD (Plasma-Enhanced Chemical Vapor Deposition) process. This method describes how to process a substrate by adjusting the temperature profile to change the deposition rate across the substrate. Additionally, the plasma density profile is modified to influence the deposition rate. The chamber surfaces exposed to the plasma are heated to enhance plasma density uniformity and minimize the formation of low-quality deposits. In situ metrology is utilized to monitor the deposition process and trigger control actions related to substrate temperature, plasma density, pressure, temperature, and reactant flow.

Career Highlights

Dmitriy Panasyuk has made significant contributions to the field of substrate processing during his career at Applied Materials, Inc. His innovative approaches have led to advancements that improve the efficiency and quality of deposition processes.

Collaborations

Throughout his career, Dmitriy has collaborated with esteemed colleagues such as Nagarajan Rajagopalan and Xinhai Han. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies.

Conclusion

Dmitriy Panasyuk's contributions to the field of substrate processing through his innovative PECVD methods highlight his expertise and dedication as an inventor. His work continues to influence advancements in the industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…