Jena, Germany

Dirk Thiele

This inventor holds 2 USPTO granted patents. Top assignees: Carl Zeiss Ag, Carl Zeiss Microscopy Gmbh. Active years: 2017-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dirk Thiele. Retrieved from https://idiyas.com/inventor/dirk-thiele-kcd9vyju

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2017-2019

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Dirk Thiele: Innovator in Movable Mirror Technology

Introduction

Dirk Thiele is a notable inventor based in Jena, Germany. He has made significant contributions to the field of optical technology, particularly through his innovative designs in movable mirror devices. With a total of 2 patents to his name, Thiele's work exemplifies the intersection of engineering and practical application.

Latest Patents

Thiele's latest patents include a groundbreaking movable mirror device. This device is designed as a unitary system that incorporates a position sensor and an analog-to-digital converter. The integration of these components allows for enhanced functionality and precision in optical applications.

Career Highlights

Throughout his career, Dirk Thiele has worked with prestigious companies such as Carl Zeiss Microscopy GmbH and Carl Zeiss AG. His experience in these organizations has provided him with a solid foundation in optical technology and innovation.

Collaborations

Thiele has collaborated with various professionals in his field, including his coworker Carsten Wehe. These partnerships have contributed to the development and refinement of his inventions.

Conclusion

Dirk Thiele's contributions to movable mirror technology highlight his innovative spirit and dedication to advancing optical systems. His patents and career achievements reflect a commitment to excellence in engineering and invention.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…