Dimitry Dinega

Title: The Innovative Contributions of Dimitry Dinega

Introduction

Dimitry Dinega is a notable inventor based in Aurora, IL (US). He has made significant contributions to the field of chemical mechanical polishing (CMP) through his innovative patent. His work focuses on improving the methods used for polishing substrates that comprise silicon dioxide, silicon nitride, and polysilicon materials.

Latest Patents

Dinega holds a patent titled "Compositions and methods for CMP of silicon oxide, silicon nitride, and polysilicon materials." This invention provides a chemical mechanical polishing method that effectively polishes a substrate made of silicon dioxide, silicon nitride, and polysilicon. The method involves abrading the surface of the substrate with a CMP composition designed to remove these materials. The CMP composition includes a particulate ceria abrasive suspended in an aqueous carrier with a pH ranging from about 3 to 9.5, which contains a cationic polymer. The cationic polymer is specifically a quaternary methacryloyloxyalkylammonium polymer. Dinega's innovative approach enhances the efficiency and effectiveness of the CMP process.

Career Highlights

Dimitry Dinega is associated with Cabot Microelectronics Corporation, where he applies his expertise in the field of materials science and engineering. His work at the company has contributed to advancements in semiconductor manufacturing processes. Dinega's dedication to innovation is evident in his research and development efforts.

Collaborations

Dinega has collaborated with notable colleagues, including Kevin J Moeggenborg and William J Ward. These collaborations have fostered a productive environment for innovation and have led to significant advancements in their respective fields.

Conclusion

Dimitry Dinega's contributions to the field of chemical mechanical polishing through his patent demonstrate his commitment to innovation and excellence. His work continues to impact the semiconductor industry positively.