Dimitrios Antartis

Title: Innovations of Dimitrios Antartis

Introduction

Dimitrios Antartis is a notable inventor based in Hillsboro, OR (US). He has made significant contributions to the field of integrated circuit technology. His work focuses on optimizing interlayer dielectric stacks to reduce wafer bow, which is crucial for enhancing the performance of integrated circuits.

Latest Patents

Dimitrios holds 1 patent for his invention titled "Interlayer dielectric stack optimization for wafer bow reduction." This patent describes an integrated circuit (IC) die that includes a first metallization layer with first interconnect structures and a second metallization layer with second interconnect structures. The interlayer dielectric (ILD) stack between these layers features a stress modulation layer and a capping layer. The design aims to mitigate intrinsic stress in the metallization layers, thereby improving the overall performance of the IC.

Career Highlights

Dimitrios Antartis is currently employed at Intel Corporation, a leading technology company known for its innovations in semiconductor manufacturing. His work at Intel has positioned him as a key player in advancing integrated circuit technologies.

Collaborations

Dimitrios has collaborated with several talented individuals in his field, including Gwang-Soo Kim and Han Ju Lee. These collaborations have contributed to the development of cutting-edge technologies in integrated circuits.

Conclusion

Dimitrios Antartis is a prominent inventor whose work in optimizing interlayer dielectric stacks has the potential to significantly impact the field of integrated circuits. His contributions at Intel Corporation and his collaborations with other experts highlight his importance in the technology sector.