Dietmar Wagner

Title: Dietmar Wagner: Innovator in Lithography Technology

Introduction

Dietmar Wagner is a prominent inventor based in Fellbach-Oeffingen, Germany. He has made significant contributions to the field of lithography, particularly in the development of devices that enhance the manufacturing of semiconductor components. With a total of 5 patents to his name, Wagner's work is recognized for its innovative approach to optical lithography.

Latest Patents

One of Wagner's latest patents is the Reflective Phaseshift Lithography System. This invention refers to a lithographic device designed for transferring patterns onto a wafer. The primary objective of this invention is to create a new optical lithographic device that offers improved resolution and depth of sharpness. This advancement allows for the production of semiconductor components with a higher packing density. The device incorporates an imaging system that includes an interferometric device with a confocal beam path and a reflection phase shift mask. Given its capabilities, this device is suitable for use in DUV step and scan systems, which are essential for manufacturing highly integrated semiconductor components. In this context, electron-beam and x-ray lithography are only necessary for smaller grids.

Career Highlights

Dietmar Wagner is currently associated with International Business Machines Corporation (IBM), where he continues to push the boundaries of lithographic technology. His work has been instrumental in advancing the capabilities of semiconductor manufacturing processes.

Collaborations

Wagner collaborates with various professionals in the field, including his coworker Michael H Kallmeyer. Their combined expertise contributes to the innovative projects at IBM.

Conclusion

Dietmar Wagner's contributions to lithography technology exemplify the spirit of innovation in the semiconductor industry. His patents and ongoing work continue to influence the development of advanced manufacturing techniques.