The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2000
Filed:
Jul. 20, 1999
Dietmar Wagner, Fellbach-Oeffingen, DE;
International Business Machines Corporation, Armonk, NY (US);
Abstract
The invention refers to a lithographic device for transferring patterns onto a wafer. The task of the invention is to create a new optical lithographic device with improved resolution and depth of sharpness which will allow semiconductor components to be produced with a higher packing density. According to the invention, an imaging device is used which includes an interferometric device with confocal beam path and a reflection phase shift mask. Based on the achievable resolution and depth of sharpness, the device is suitable for use in DUV step and scan systems for the manufacture of highly integrated semiconductor components. Electron-beam and x-ray lithography only have to be used for smaller grids.