The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 1987
Filed:
Mar. 18, 1985
Dietmar Wagner, Gartringen, DE;
International Business Machines Corporation, Armonk, NY (US);
Abstract
This teaches a method and device for testing of the surface of a transparent object such as a photolithographic mask in which respective recordings with darkfield reflection illumination and darkfield transmission illumination is made, and the intensities measured are compared to form a different image, in which defects are characterized by high local levels of light intensity. Both recordings can be generated in a point-by-point mode if the surface is scanned by a focussed laser beam. In another embodiment, two recordings of the entire surface are digitized, and examined arithmetically for local image differences. Surfaces of opaque bodies can also be examined with the difference image of two darkfield reflection recordings made at different angles of illumination.