Nidderau, Germany

Dietmar Liedtke

This inventor holds 1 USPTO granted patent. Top assignee: Nukem Limited. Active years: 1990.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dietmar Liedtke. Retrieved from https://idiyas.com/inventor/dietmar-liedtke

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1990

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Dietmar Liedtke: Innovator in Plasma-Chemical Processes

Introduction

Dietmar Liedtke is a notable inventor based in Nidderau, Germany. He has made significant contributions to the field of plasma-chemical processes, showcasing his expertise through his innovative patent.

Latest Patents

Liedtke holds a patent for a "Method and device for forming a layer by plasma-chemical process." This invention proposes a method and device for the formation of a layer on a substrate's surface, aligning it parallel to the electrical field necessary for the plasma-chemical process. The gas required for this process flows directly onto the surface, enhancing efficiency and effectiveness.

Career Highlights

Dietmar Liedtke is associated with Nukem Limited, where he applies his knowledge and skills in developing advanced technologies. His work has positioned him as a key figure in the innovation of plasma-chemical applications.

Collaborations

Liedtke has collaborated with notable colleagues, including Berthold Schum and WoJorg, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Dietmar Liedtke's contributions to plasma-chemical processes exemplify his commitment to innovation in technology. His patent reflects a significant advancement in the field, and his work continues to influence the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…