Tann, Germany

Dietmar Kirsten

This inventor holds 1 USPTO granted patent. Top assignee: Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh. Active years: 1978.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dietmar Kirsten. Retrieved from https://idiyas.com/inventor/dietmar-kirsten

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 1978

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1 patent (USPTO):Explore Patents

Title: The Innovations of Dietmar Kirsten

Introduction

Dietmar Kirsten is a notable inventor based in Tann, Germany. He has made significant contributions to the field of semiconductor technology. His work primarily focuses on etching agents for III/V semiconductors, which are crucial for various electronic applications.

Latest Patents

Dietmar holds a patent for an etching agent specifically designed for III/V semiconductor materials. This innovation enhances the efficiency and effectiveness of semiconductor manufacturing processes. His patent is a testament to his expertise and dedication to advancing technology in this field. He has 1 patent to his name.

Career Highlights

Dietmar Kirsten is associated with Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, a company known for its contributions to electronic materials. His role at the company has allowed him to work on cutting-edge technologies that impact the semiconductor industry.

Collaborations

Throughout his career, Dietmar has collaborated with talented individuals such as Franz Kuhn-Kuhnenfeld and Marianne Maier. These partnerships have fostered innovation and have been instrumental in the development of new technologies.

Conclusion

Dietmar Kirsten's work in semiconductor technology exemplifies the spirit of innovation. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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