Gates Mills, OH, United States of America

Dickson L Whitney, Jr

This inventor holds 1 USPTO granted patent. Top assignee: Atotech Deutschland Gmbh. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dickson L Whitney, Jr. Retrieved from https://idiyas.com/inventor/dickson-l-whitney-jr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 39(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: The Innovations of Dickson L Whitney, Jr.

Introduction

Dickson L Whitney, Jr. is an accomplished inventor based in Gates Mills, OH (US). He has made significant contributions to the field of polymeric materials, particularly in their adhesion to metal surfaces. His work has led to advancements that are crucial for various industrial applications.

Latest Patents

Whitney holds a patent for the adhesion of polymeric materials to metal surfaces. This innovation is essential for improving the durability and performance of products that require strong bonding between different materials. His patent portfolio includes 1 patent that showcases his expertise in this area.

Career Highlights

Whitney is currently employed at Atotech Deutschland GmbH, a company known for its innovative solutions in the field of surface finishing and electroplating. His role at Atotech allows him to apply his knowledge and skills to develop cutting-edge technologies that benefit various industries.

Collaborations

Throughout his career, Whitney has collaborated with notable professionals in his field, including George S Bokisa and Craig V Bishop. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Dickson L Whitney, Jr. is a prominent figure in the realm of polymeric material adhesion, with a valuable patent and a career dedicated to advancing technology. His contributions continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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