Taipei, Taiwan

Di-yan Wang

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignees: National Taiwan Normal University, National Taiwan University. Active years: 2015.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Di-yan Wang: Innovator in Graphene Technology

Introduction

Di-yan Wang is a prominent inventor based in Taipei, Taiwan. He is known for his significant contributions to the field of graphene technology. His innovative approach has led to advancements that enhance the electrical properties of graphene layers.

Latest Patents

Di-yan Wang holds a patent for a method of transferring a graphene layer. The patent describes a process where a graphene layer formed on a metal carrier is electrostatically adsorbed onto a substrate. This method involves immersing the substrate in an etching solution to remove the metal carrier layer, thereby completing the transfer of the graphene layer. This invention not only simplifies the transfer process but also addresses the issue of retaining organic residues, which improves the electrical properties of the transferred graphene layer.

Career Highlights

Throughout his career, Di-yan Wang has worked with esteemed institutions such as National Taiwan University and National Taiwan Normal University. His work in these institutions has allowed him to collaborate with other experts in the field and contribute to groundbreaking research.

Collaborations

Some of his notable coworkers include I-sheng Huang and Chun-Wei Chen. Their collaborative efforts have further advanced the research and development of graphene technologies.

Conclusion

Di-yan Wang's innovative methods in graphene technology have made a significant impact in the field. His patent demonstrates a practical solution to challenges in transferring graphene layers, showcasing his expertise and dedication to advancing material science.

Profile summary based on public USPTO records.
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