Devarajan Balaraman

Title: Devarajan Balaraman: Innovator in High Capacitance Density Structures

Introduction

Devarajan Balaraman is a notable inventor based in Atlanta, GA. He has made significant contributions to the field of high capacitance density structures, showcasing his expertise through innovative patents. His work is particularly relevant in the realm of advanced materials and electronics.

Latest Patents

Balaraman holds a patent for "Integrating three-dimensional high capacitance density structures." This patent discloses three-dimensional dielectric structures on high surface area electrodes and outlines various fabrication methods. The exemplary structures include a copper foil substrate, trench electrodes, or high surface area porous electrode structures formed on the substrate. An insulating thin film is formed on the surface, and the foil is laminated on an organic substrate. The materials used for the films include perovskite ceramics such as barium titanate, strontium titanate, barium strontium titanate (BST), and lead zirconate titanate (PZT). Other materials include intermediate dielectric constant films like zinc oxide, aluminum nitride, and silicon nitride, as well as typical paraelectrics such as tantalum oxide, alumina, and titania. The films can be fabricated using techniques such as sol-gel, hydrothermal synthesis, anodization, or vapor deposition.

Career Highlights

Balaraman is affiliated with the Georgia Tech Research Corporation, where he continues to push the boundaries of research and innovation. His work has garnered attention for its potential applications in various technological fields.

Collaborations

Some of his notable coworkers include Markondeya Raj Pulugurtha and Isaac Robin Abothu. Their collaborative efforts contribute to the advancement of research in high capacitance density structures.

Conclusion

Devarajan Balaraman is a prominent inventor whose work in high capacitance density structures has the potential to impact various industries. His innovative approach and dedication to research exemplify the spirit of invention in modern technology.