Chengdu, China

Desen Wang

This inventor holds 1 USPTO granted patent. Top assignees: Diodes Inc., Diodes Technology (Chengdu) Company Limited, Shanghai Kaihong Electronic Company Limited. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Desen Wang. Retrieved from https://idiyas.com/inventor/desen-wang-fsp4hd4r

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Desen Wang and Semiconductor Molding Innovation.

Introduction

Desen Wang is an inventor associated with Chengdu, China. His work includes a patent for semiconductor molding equipment and foreign-object detection.

Latest Patents

Wang’s listed patent, “Semiconductor Molding System and Foreign Object Detection Method,” describes a system with a molding device, an image collection device, and a controller. Before molding, the image collection device captures an image of the lead frame. The controller compares that image with a reference image to determine whether foreign objects are present in a non-molding area. The patent also describes a method for detecting foreign objects on a lead frame before molding. Wang is listed with 1 patent.

Career Highlights

Wang’s listed company affiliations include Diodes Inc. and Shanghai Kaihong Technology Co., Ltd. His patent focuses on using image-based inspection to identify potential contaminants before semiconductor molding.

Collaborations

Zhigang Feng is identified as Wang’s coworker. The available information does not specify their roles or describe a particular joint project.

Conclusion

Desen Wang’s listed patent addresses pre-molding foreign-object detection, applying image comparison to help inspect lead frames before they enter the molding process.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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