Pleasant Valley, NY, United States of America

Dermott A Macpherson


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2006

where 'Filed Patents' based on already Granted Patents

1 patent (USPTO):

Title: **Dermott A. Macpherson: A Pioneer in Semiconductor Processing**

Introduction

Dermott A. Macpherson is an innovative inventor based in Pleasant Valley, NY, known for his significant contributions to the field of semiconductor processing. With a keen focus on improving methods for etching semiconductor structures, he has been able to drive advancements in technology through his inventive work.

Latest Patents

Macpherson holds a patent for a groundbreaking method of reworking structures that incorporate low-k dielectric materials. His patent involves methods of etching a semiconductor structure using ion milling with a variable-position endpoint detector to unlayer multiple interconnect layers, including low-k dielectric films. This unique process is designed to control the ion milling based on the specific material type, ensuring a planar surface with minimal damage to the exposed materials. By employing an ion beam to mill a first layer and detect the endpoint via an optical detector, Macpherson’s invention allows for precise exposure and removal of low-k dielectric films, thereby enhancing the efficiency of semiconductor processing.

Career Highlights

Throughout his career at International Business Machines Corporation (IBM), Macpherson has refined his expertise and established himself as a vital contributor to semiconductor technologies. His innovative approaches have not only led to his patent but have also influenced the practices and methods used within the industry.

Collaborations

Macpherson has worked alongside talented professionals, including Terence Lawrence Kane and Chung-Ping Eng. Their collaborations have enabled them to tackle complex challenges in semiconductor processing, facilitating advancements that benefit the broader technology landscape.

Conclusion

Dermott A. Macpherson's contributions to the field of semiconductor processing are noteworthy, particularly his patented methods that enhance the etching of structures incorporating low-k dielectric materials. His work at IBM and collaborations with other professionals illustrate his commitment to innovation, making him a respected inventor in the technology sector. As advancements in semiconductor processing continue to evolve, Macpherson's ingenuity will likely play a significant role in shaping its future.

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