Derk Onck

Title: Derk Onck: Innovator in Measurement Systems

Introduction

Derk Onck is a notable inventor based in Leende, Netherlands. He has made significant contributions to the field of measurement systems, particularly in the characterization of patterning devices. His innovative approach has led to the development of a unique patent that enhances the precision of measurement techniques.

Latest Patents

Derk Onck holds a patent for a "Measurement system and method for characterizing a patterning device." This patent outlines a method for determining surface parameters of a patterning device. The process involves positioning the device with respect to an exposure radiation beam, utilizing a chromatic lens to illuminate the surface, and collecting spectral information to ascertain surface parameters. This innovative method is crucial for improving the accuracy of patterning devices used in various applications.

Career Highlights

Derk Onck is associated with ASML Netherlands B.V., a leading company in the semiconductor industry. His work at ASML has allowed him to contribute to advancements in lithography technology, which is essential for the production of integrated circuits. His expertise in measurement systems has positioned him as a valuable asset within the company.

Collaborations

Derk has collaborated with several talented individuals, including Andre Bernardus Jeunink and Erik Henricus Egidius Catharina Eummelen. These collaborations have fostered an environment of innovation and have led to the successful development of new technologies in the field.

Conclusion

Derk Onck's contributions to measurement systems and his innovative patent demonstrate his commitment to advancing technology in the semiconductor industry. His work continues to influence the development of more precise and efficient patterning devices.