Asml Netherlands B.v.

Derk Onck

Andre Bernardus Jeunink

Erik Henricus Egidius Catharina Eummelen

Bearrach Moest

Johannes Adrianus Cornelis Maria Pijnenburg

Hermen Folken Pen

A method is provided for determining surface parameters of a patterning device, comprising the steps of: positioning the patterning device with respect to a path of an exposure radiation beam using a first measurement system, providing the patterning device at a first focal plane of a chromatic lens arranged in a second measurement system, illuminating a part of a surface of the patterning device with radiation through the chromatic lens, wherein the radiation comprises a plurality of wavelengths, determining a position of the illuminated part of the patterning device in a first and second direction, collecting at least a portion of radiation reflected by the patterning device through the chromatic lens, measuring an intensity of the collected portion of radiation as a function of wavelength, to obtain spectral information of the illuminated area, and determining the surface parameters of the patterning device at the determined position from the spectral information.

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Leende, Netherlands

Derk Onck