Kyunggi-do, South Korea

Deok Hyung Lee


Average Co-Inventor Count = 6.0

ph-index = 2

Forward Citations = 112(Granted Patents)


Company Filing History:


Years Active: 2006-2009

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Deok Hyung Lee

Introduction

Deok Hyung Lee, an accomplished inventor based in Kyunggi-do, South Korea, has made significant strides in the field of semiconductor technology. With a total of two patents to his name, Lee has demonstrated expertise in developing advanced semiconductor constructions that enhance performance in FinFET devices.

Latest Patents

Lee's most recent innovations include a groundbreaking semiconductor fin construction designed specifically for FinFET devices. This invention features a unique multi-structured Si-fin that consists of an upper region characterized by substantially vertical sidewalls and a lower region with inclined sidewalls, resulting in a wider base portion. Moreover, his innovative designs incorporate a horizontal step region at the interface between the two regions, which enhances functionality. The patents also involve various methods for manufacturing semiconductor devices that utilize this dual construction, integrating insulating materials such as silicon dioxide and silicon nitride to create shallow trench isolation (STI) structures between adjacent semiconductor fins.

Career Highlights

Deok Hyung Lee is currently an integral part of Samsung Electronics Co., Ltd., a leading company in the technology sector. His work focuses on advancing semiconductor technology, and his inventions have the potential to significantly improve device performance and efficiency.

Collaborations

Throughout his career, Lee has collaborated with notable colleagues such as Byeong Chan Lee and In Soo Jung. These partnerships have fostered a collaborative environment that encourages innovation and the development of cutting-edge technologies within the semiconductor industry.

Conclusion

In summary, Deok Hyung Lee has emerged as a prominent figure in the realm of semiconductor invention, with a focus on FinFET devices. His contributions, including the innovative multi-structured Si-fin, underline the importance of ongoing research and development in this field. As technology continues to evolve, Lee's work will likely play a crucial role in shaping the future of semiconductor applications.

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