Company Filing History:
Years Active: 2025
Title: Innovations of Dennis Rodier
Introduction
Dennis Rodier is an accomplished inventor based in Francestown, New Hampshire. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to ion implantation processes.
Latest Patents
Rodier's latest patents include a method and apparatus for controlled ion implantation. This patent describes a method of operating a beamline ion implanter, which involves performing a first implant procedure to implant a dopant of a first polarity into a semiconductor substrate. The method generates an estimated implant dose based on filtered information from the first procedure and calculates an actual implant dose using a predictive model. An adjusted second implant procedure is then performed to implant a dopant of a second polarity based on the actual implant dose.
Another notable patent is focused on localized stress modulation by implanting the first side of a substrate to reduce in-plane distortion along the second side. This method includes providing a substrate with features on one side, performing a metrology scan to determine distortion, and depositing a stress compensation film on the opposite side. The stress and thickness of the film are determined based on the distortion amount, and ions are directed to the film during the ion implant procedure.
Career Highlights
Dennis Rodier is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work has significantly advanced the understanding and application of ion implantation techniques, contributing to the efficiency and effectiveness of semiconductor manufacturing.
Collaborations
Rodier has collaborated with notable colleagues, including Sony Varghese and Pradeep Subrahmanyan. These collaborations have fostered a productive environment for innovation and development in their field.
Conclusion
Dennis Rodier's contributions to semiconductor technology through his patents and work at Applied Materials, Inc. highlight his role as a key innovator in the industry. His advancements in ion implantation processes continue to influence the future of semiconductor manufacturing.