Dennis Radgowski

Title: Dennis Radgowski: Innovator in Coating Technologies

Introduction

Dennis Radgowski is a notable inventor based in Brighton, MA (US). He has made significant contributions to the field of coating technologies, particularly through his innovative patent that enhances the durability of components used in reactive ion etching (RIE).

Latest Patents

Radgowski holds a patent for "Articles coated with fluoro-annealed films." This invention relates to articles and methods that feature coatings with superior plasma etch-resistance. The technology is designed to prolong the life of RIE components. The patented article includes a vacuum-compatible substrate and a protective film that covers at least a portion of the substrate. The film is composed of a fluorinated metal oxide containing yttrium, which contributes to its enhanced performance.

Career Highlights

Dennis Radgowski is currently employed at Entegris, Inc., a company known for its advanced materials and solutions for the semiconductor industry. His work at Entegris has allowed him to focus on developing innovative solutions that meet the evolving needs of the market.

Collaborations

Radgowski has collaborated with talented professionals such as I-Kuan Lin and Nilesh Gunda. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

In summary, Dennis Radgowski is a distinguished inventor whose work in coating technologies has made a significant impact in the semiconductor industry. His innovative patent demonstrates his commitment to advancing the field and improving the longevity of critical components.