The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2021
Filed:
Sep. 30, 2015
Applicant:
Entegris, Inc., Billerica, MA (US);
Inventors:
I-Kuan Lin, Lexington, MA (US);
Nilesh Gunda, North Chelmsford, MA (US);
Dennis Radgowski, Brighton, MA (US);
Chandra Venkatraman, Tyngsboro, MA (US);
Assignee:
ENTEGRIS, INC., Billerica, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/48 (2006.01); C23C 14/58 (2006.01); C23C 14/08 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 14/48 (2013.01); C23C 14/08 (2013.01); C23C 14/083 (2013.01); C23C 14/58 (2013.01); C23C 14/5806 (2013.01); C23C 14/5846 (2013.01); H01J 37/32467 (2013.01); H01J 37/32495 (2013.01);
Abstract
Articles and methods relating to coatings having superior plasma etch-resistance and which can prolong the life of RIE components are provided. An article has a vacuum compatible substrate and a protective film overlying at least a portion of the substrate. The film comprises a fluorinated metal oxide containing yttrium.