River Forest, IL, United States of America

Dennis R Jarnecke

This inventor holds 11 USPTO granted patents and 1 published patent application, plus 1 CIPO patent and 1 EPO patent. Top assignees: Gas Technology Institute, Operations Technology Development, Nfp, Opw-Engineered Systems, Inc.. Active years: 2007-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dennis R Jarnecke. Retrieved from https://idiyas.com/inventor/dennis-r-jarnecke

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 11 

% Patents Active = 90.9



Average Co-Inventor Count = 2.6

ph-index = 4

Forward Citations = 45(Granted Patents)


Company Filing History:


Years Active: 2007-2023

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11 patents (USPTO):Explore Patents

Title: The Innovative Journey of Dennis R Jarnecke

Introduction: Dennis R Jarnecke, a distinguished inventor hailing from River Forest, IL (US), has made significant contributions to the field of technology through his groundbreaking inventions and patents.

Latest Patents: Dennis R Jarnecke's latest patents showcase his commitment to innovation, with a focus on cutting-edge technologies in the digital realm, including advancements in artificial intelligence and cybersecurity.

Career Highlights: Throughout his illustrious career, Dennis R Jarnecke has been recognized for his pioneering work in developing solutions that have revolutionized the way we interact with technology. His patents have laid the foundation for numerous advancements in the industry.

Collaborations: Dennis R Jarnecke has collaborated with leading tech companies and research institutions to bring his inventions to life. His ability to work across disciplines and with diverse teams has been instrumental in the success of his projects.

Conclusion: Dennis R Jarnecke's passion for innovation and his dedication to pushing the boundaries of technology have solidified his reputation as a visionary inventor. His contributions continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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