Bochum, Germany

Dennis Pohle

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Ruhr-Universitat Bochum. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dennis Pohle. Retrieved from https://idiyas.com/inventor/dennis-pohle-8kuhvrvj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Dennis Pohle: Innovator in Plasma Measurement Technology

Introduction

Dennis Pohle is a notable inventor based in Bochum, Germany. He has made significant contributions to the field of plasma measurement technology. His innovative work focuses on enhancing the accuracy and efficiency of measuring plasma parameters.

Latest Patents

Dennis Pohle holds a patent for a "Probe for measuring plasma parameters." This invention utilizes active plasma resonance spectroscopy to measure plasma parameters effectively. The probe features an external coupling, a balun, an internal coupling, and a probe head. These components are integrated into an electrically-insulating substrate cylinder, which has a layered structure made from multiple substrate layers along its rotational axis. This design allows for improved measurement of plasma parameters while minimizing the influence on the plasma during the measurement process. He has 1 patent to his name.

Career Highlights

Dennis Pohle is affiliated with Ruhr-Universität Bochum, where he continues to advance research in plasma measurement technologies. His work has garnered attention for its innovative approach and practical applications in various scientific fields.

Collaborations

Dennis has collaborated with colleagues such as Christian Schulz and Ilona Rolfes, contributing to the advancement of research in his area of expertise.

Conclusion

Dennis Pohle's contributions to plasma measurement technology exemplify the impact of innovative thinking in scientific research. His patented probe represents a significant advancement in the field, showcasing his dedication to improving measurement techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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