This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 2005.
Company Filing History:
Years Active: 2005
Title: Dennis L. Macaluso: Innovator in Photolithographic Technology
Introduction
Dennis L. Macaluso is a notable inventor based in South Burlington, Vermont. He has made significant contributions to the field of semiconductor technology, particularly in photolithography. His innovative approach has led to advancements that enhance the precision of semiconductor manufacturing processes.
Latest Patents
One of Macaluso's key patents is titled "Method for detection of photolithographic defocus." This invention focuses on determining the location of a defect source that results in localized elevation on the surface topography of substrates, such as silicon wafers. The process involves placing the wafer on a chuck of a semiconductor process tool, specifically a photolithographic tool. The upper surface of the wafer is then processed to obtain topography measurements. These measurements are analyzed to detect any localized elevations, and calculations are performed to ascertain whether the source of the elevation originates from the chuck.
Career Highlights
Dennis L. Macaluso is associated with the International Business Machines Corporation (IBM), where he has contributed to various projects in semiconductor technology. His work has been instrumental in improving the accuracy and efficiency of photolithographic processes.
Collaborations
Macaluso has collaborated with notable colleagues, including Richard A. Phelps and Charles Arthur Whiting. Their combined expertise has fostered innovation in the field and has led to the development of advanced technologies.
Conclusion
Dennis L. Macaluso's contributions to photolithographic technology exemplify the impact of innovative thinking in the semiconductor industry. His patent and collaborative efforts continue to influence advancements in manufacturing processes.