Felton, CA, United States of America

Dennis C Fenske


Average Co-Inventor Count = 5.0

ph-index = 4

Forward Citations = 2,013(Granted Patents)


Company Filing History:


Years Active: 1998-2002

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4 patents (USPTO):Explore Patents

Title: The Innovative Mind of Dennis C. Fenske

Introduction

Dennis C. Fenske, an accomplished inventor based in Felton, CA, has demonstrated remarkable ingenuity throughout his career. With a total of four patents to his name, he has made significant contributions to the field of plasma-enhanced chemical processing, focusing on technologies that enhance substrate processing.

Latest Patents

Fenske's latest inventions include groundbreaking technology such as the "Plasma Enhanced Chemical Processing Reactor" and "Plasma Enhanced Chemical Processing Reactor and Method." The former is an advanced apparatus designed for processing substrates, featuring a processing chamber and a sophisticated substrate support system that includes an electrostatic chuck. This innovation plays a vital role in modern semiconductor manufacturing by distributing plasma efficiently within a processing environment. His other patent focuses on a reactor that incorporates a plasma chamber, a source of electromagnetic energy, and a method for generating a plasma that interacts with reactive gases, ultimately depositing layers of material on wafers in a controlled manner.

Career Highlights

Throughout his career, Fenske has worked with prominent technology companies such as Watkins-Johnson Company and Applied Materials, Inc. His expertise in engineering and plasma technologies has enabled him to make substantial advancements in the industry, particularly in the fabrication of semiconductor devices.

Collaborations

During his journey as an inventor, Fenske has collaborated with esteemed professionals, including William J. Durbin and Richard H. Matthiesen. These collaborations have fostered an environment of innovation, allowing for the development of advanced technologies that benefit the semiconductor industry.

Conclusion

Dennis C. Fenske stands out as a remarkable inventor whose contributions to plasma processing technologies have had a lasting impact on the industry. With a dedication to innovation and a career marked by significant achievements, Fenske continues to inspire future generations of inventors in the field of semiconductor manufacturing.

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