The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2002
Filed:
May. 18, 2000
Applicant:
Inventors:
Ron van Os, Sunnyvale, CA (US);
William J. Durbin, Capitola, CA (US);
Richard H. Matthiesen, San Jose, CA (US);
Dennis C. Fenske, Felton, CA (US);
Eric D. Ross, Santa Cruz, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/600 ;
U.S. Cl.
CPC ...
C23C 1/600 ;
Abstract
An apparatus for processing a substrate comprising a processing chamber and a substrate support system comprising an electrostatic chuck having a body portion and a substrate support surface and one or more arms extending from the body portion to mount the electrostatic chuck to a side wall portion of the processing chamber is provided.
Published as:
TW283250B; WO9703224A1; KR970008401A; JPH09167762A; EP0839217A1; CN1189859A; US5792272A; US6001267A; KR100241171B1; US6178918B1; EP0839217A4; US6375750B1; CN1160479C; JP3701390B2; EP0839217B1; ATE331053T1; DE69636286D1; DE69636286T2;